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dc.contributor.authorSHVETS, IGOR
dc.contributor.authorARORA, SUNIL KUMAR
dc.date.accessioned2010-07-15T16:12:20Z
dc.date.available2010-07-15T16:12:20Z
dc.date.issued2005
dc.date.submitted2005en
dc.identifier.citationChoudhary, R. J.; Kumar, R.; Khan, M. W.; Srivastava, J. P.; Patil, S. I.; Arora, S. K.; Shvets, I. V., Exposition of semiconducting and ferromagnetic properties of pulsed-laser-deposited thin films of LaFe1-xNixO3 (x=0.3, 0.4, and 0.5), Applied Physics Letters, 87, 13, 2005, 132104en
dc.identifier.otherY
dc.descriptionPUBLISHEDen
dc.description.abstractWe have explored the possibility of ferromagnetic semiconducting property in the epitaxial thin films of LaFe1?xNixO3 x=0.3, 0.4, and 0.5 grown on 001 oriented LaAlO3 substrate. We observe that substitution of Ni in the series leads to the increase in conductivity of the samples with conduction being controlled by the disorder-induced localization of charge carriers. All these samples show ferromagnetic behavior at room temperature while their magnetization decreases with increase in Ni concentration in the composition. The results have been explained on the basis of the close interplay between the electrical and magnetic properties.en
dc.format.extent132104en
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.relation.ispartofseriesApplied Physics Letters;
dc.relation.ispartofseries87;
dc.relation.ispartofseries13;
dc.rightsYen
dc.subjectSurface Physicsen
dc.subjectthin filmsen
dc.titleExposition of semiconducting and ferromagnetic properties of pulsed-laser-deposited thin films of LaFe1-xNixO3 (x=0.3, 0.4, and 0.5)en
dc.typeJournal Articleen
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/ivchvets
dc.identifier.peoplefinderurlhttp://people.tcd.ie/aroras
dc.identifier.rssinternalid30506
dc.identifier.rssurihttp://dx.doi.org/10.1063/1.2058218en
dc.identifier.urihttp://hdl.handle.net/2262/40393


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