Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Thickness
Citation:
Lebreton, A. and Barbé, J. and Lethien, C. and Coleman, J.N. and Brousse, T., Tuning Deposition Conditions for VN Thin Films Electrodes for Microsupercapacitors: Influence of the Thickness, Journal of the Electrochemical Society, 171, 9, 2024Abstract:
Vanadium nitride is a highly promising material for micro-pseudocapacitors when used as a bifunctional thin film, i.e. an electrode material and a current collector, owing to its remarkable electrical and electrochemical properties. However, the specific limitations associated with high-rate cycling remain unclear. In this study, we evaluate how the characteristic time associated with charge/discharge of vanadium nitride films is modified with the film thicknesses using electrochemical impedance spectroscopy and cyclic voltammetry measurements coupled to a semi-empirical model commonly utilized to assess the high-rate behaviour of battery electrodes. Both methodologies are in good agreement and revealed that rate capability of this bi-functional material is limited by the VN electrical conductivity. To confirm this finding, VN thin films were sputtered on platinum current collectors, leading to a six-fold reduction in the characteristic time associated with charge/discharge of the current collectors/electrode material. This underscores the importance of using current collectors even for highly conductive electrode materials.
Author's Homepage:
http://people.tcd.ie/colemaj
Author: Coleman, Jonathan
Type of material:
Journal ArticleCollections
Series/Report no:
Journal of the Electrochemical Society;171;
9;
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Full text availableDOI:
http://dx.doi.org/10.1149/1945-7111/ad75beMetadata
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