Influence of elastic strains on the mask ratio in glassy polymer nanoimprint
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2005Citation:
Graham L. W. Cross, Barry S. O'Connell, and John B. Pethica `Influence of elastic strains on the mask ratio in glassy polymer nanoimprint? in Applied Physics Letters, 86, (8), 2005, 081902Download Item:
Abstract:
During glassy polymer nanoimprint, a supported film is extruded from protruding spunchd to
recessed scavityd regions of a patterned stamp. The completeness of this extrusion determines the
mask ratio for lithographic applications. We show that, for a given punch contact size, there is a
residual layer of unextruded material with a mean thickness that is independent of initial film
thickness, stamping time, or applied maximum load. Depth sensing indentation enables us to
monitor deformation during the imprinting as well as after, and so understand the deformation
process involved. It is found that both the geometry and mean thickness of the residual layer are
influenced by the overall elastic properties of the stamping system.
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Science Foundation Ireland
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http://people.tcd.ie/crossgDescription:
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Science Foundation IrelandPublisher:
American Institute of PhysicsType of material:
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Applied Physics Letters86
8
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