Show simple item record

dc.contributor.authorBLAU, WERNERen
dc.contributor.authorNICOLOSI, VALERIAen
dc.date.accessioned2014-03-28T16:04:24Z
dc.date.available2014-03-28T16:04:24Z
dc.date.issued2010en
dc.date.submitted2010en
dc.identifier.citationKumar, S., McEvoy, N., Lutz, T., Keeley, G.P., Nicolosi, V., Murray, C.P., Blau, W.J., Duesberg, G.S., Gas phase controlled deposition of high quality large-area graphene films, Chemical Communications, 46, 9, 2010, 1422-1424en
dc.identifier.issn13597345en
dc.identifier.otherYen
dc.descriptionPUBLISHEDen
dc.description.abstractA gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 ?Cen
dc.description.sponsorshipSK and NME acknowledge the Embark Initiative via IRCSET scholarships. TL acknowledges EU for a Marie Curie Fellowship. GSD thanks SFI for funding in frame of the CSET programen
dc.format.extent1422-1424en
dc.language.isoenen
dc.relation.ispartofseriesChemical Communicationsen
dc.relation.ispartofseries46en
dc.relation.ispartofseries9en
dc.rightsYen
dc.subjectgrapheneen
dc.titleGas phase controlled deposition of high quality large-area graphene filmsen
dc.typeJournal Articleen
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/nicoloven
dc.identifier.peoplefinderurlhttp://people.tcd.ie/wblauen
dc.identifier.rssinternalid93201en
dc.identifier.doihttp://dx.doi.org/10.1039/b919725gen
dc.rights.ecaccessrightsOpenAccess
dc.identifier.urihttp://hdl.handle.net/2262/68369


Files in this item

Thumbnail
Thumbnail

This item appears in the following Collection(s)

Show simple item record