dc.contributor.author | BLAU, WERNER | en |
dc.contributor.author | NICOLOSI, VALERIA | en |
dc.date.accessioned | 2014-03-28T16:04:24Z | |
dc.date.available | 2014-03-28T16:04:24Z | |
dc.date.issued | 2010 | en |
dc.date.submitted | 2010 | en |
dc.identifier.citation | Kumar, S., McEvoy, N., Lutz, T., Keeley, G.P., Nicolosi, V., Murray, C.P., Blau, W.J., Duesberg, G.S., Gas phase controlled deposition of high quality large-area graphene films, Chemical Communications, 46, 9, 2010, 1422-1424 | en |
dc.identifier.issn | 13597345 | en |
dc.identifier.other | Y | en |
dc.description | PUBLISHED | en |
dc.description.abstract | A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 ?C | en |
dc.description.sponsorship | SK and NME acknowledge the Embark Initiative
via
IRCSET scholarships. TL acknowledges EU for a Marie
Curie Fellowship. GSD thanks SFI for funding in frame of
the CSET program | en |
dc.format.extent | 1422-1424 | en |
dc.language.iso | en | en |
dc.relation.ispartofseries | Chemical Communications | en |
dc.relation.ispartofseries | 46 | en |
dc.relation.ispartofseries | 9 | en |
dc.rights | Y | en |
dc.subject | graphene | en |
dc.title | Gas phase controlled deposition of high quality large-area graphene films | en |
dc.type | Journal Article | en |
dc.type.supercollection | scholarly_publications | en |
dc.type.supercollection | refereed_publications | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/nicolov | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/wblau | en |
dc.identifier.rssinternalid | 93201 | en |
dc.identifier.doi | http://dx.doi.org/10.1039/b919725g | en |
dc.rights.ecaccessrights | OpenAccess | |
dc.identifier.uri | http://hdl.handle.net/2262/68369 | |