Functionalization of graphene surfaces with downstream plasma treatments

Abstract

We report on an adjustable process for the functionalization of graphene surfaces with a downstream plasma source. The parameters of oxygen plasma treatments are modified such that oxygenated functionalities can be added to the surface of graphene films prepared by chemical vapour deposition in a controlled manner. The nature of induced defects is investigated thoroughly using Raman and x-ray photoelectron spectroscopy. A massivechange in the surface properties is observed through the use of contact angle and electrochemical measurements. We propose the usage of such plasma treatments to facilitate the addition of further functional groups to the surface of graphene. The incorporation of nitrogen in to the graphene lattice by substitution of oxygenated functional groups is demonstrated outlining the validity of this approach for further functionalization.