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dc.contributor.authorMCEVOY, NIALLen
dc.date.accessioned2014-06-19T12:24:01Z
dc.date.available2014-06-19T12:24:01Z
dc.date.issued2013en
dc.date.submitted2013en
dc.identifier.citationNanjundan Ashok Kumar, Hugo Nolan, Niall McEvoy, Ehsan Rezvani, Richard L. Doyle, Michael E. G. Lyons and Georg S. Duesberg, Plasma-Assisted Simultaneous Reduction and Nitrogen Doping of Graphene Oxide Nanosheets, Journal of Materials Chemistry A, 1, 2013, 4431 - 4435en
dc.identifier.otherYen
dc.descriptionPUBLISHEDen
dc.description.abstractAn environmentally benign and scalable route for the production of gram scale quantities of nitrogen-doped graphene using a downstream microwave plasma source is reported. Simultaneous reduction and doping of graphene oxide is achieved and the process negates the need for high temperatures and toxic solvents associated with existing methods. This gas-phase low temperature process is completely dry and, thus, minimises re-aggregation of graphene flakes which is typically associated with liquid phase reduction methods. The resulting material has many potential uses, particularly in electrochemical energy.en
dc.format.extent4431en
dc.format.extent4435en
dc.language.isoenen
dc.relation.ispartofseriesJournal of Materials Chemistry Aen
dc.relation.ispartofseries1en
dc.rightsYen
dc.subjectGrapheneen
dc.titlePlasma-Assisted Simultaneous Reduction and Nitrogen Doping of Graphene Oxide Nanosheetsen
dc.typeJournal Articleen
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/mcevoynien
dc.identifier.rssinternalid94900en
dc.identifier.doihttp://dx.doi.org/10.1039/C3TA10337Den
dc.rights.ecaccessrightsopenAccess
dc.subject.TCDThemeNanoscience & Materialsen
dc.identifier.urihttp://hdl.handle.net/2262/69768


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