dc.contributor.author | DUESBERG, GEORG | en |
dc.contributor.author | MCEVOY, NIALL | en |
dc.contributor.author | NICOLOSI, VALERIA | en |
dc.contributor.author | BLAU, WERNER | en |
dc.date.accessioned | 2014-10-13T11:54:43Z | |
dc.date.available | 2014-10-13T11:54:43Z | |
dc.date.issued | 2010 | en |
dc.date.submitted | 2010 | en |
dc.identifier.citation | Kumar, S, McEvoy, N, Lutz, T, Keeley, GP, Nicolosi, V, Murray, CP, Blau, WJ, Duesberg, GS, Gas phase controlled deposition of high quality large-area graphene films, CHEMICAL COMMUNICATIONS, 46, 9, 2010, 1422-1424- | en |
dc.identifier.other | Y | en |
dc.description | PUBLISHED | en |
dc.description.abstract | A gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 degrees C. | en |
dc.format.extent | 1422-1424 | en |
dc.language.iso | en | en |
dc.relation.ispartofseries | CHEMICAL COMMUNICATIONS | en |
dc.relation.ispartofseries | 46 | en |
dc.relation.ispartofseries | 9 | en |
dc.rights | Y | en |
dc.subject | Physics | en |
dc.title | Gas phase controlled deposition of high quality large-area graphene films | en |
dc.type | Journal Article | en |
dc.type.supercollection | scholarly_publications | en |
dc.type.supercollection | refereed_publications | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/duesberg | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/wblau | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/nicolov | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/mcevoyni | en |
dc.identifier.rssinternalid | 64757 | en |
dc.identifier.doi | http://dx.doi.org/10.1039/b919725g | en |
dc.rights.ecaccessrights | openAccess | |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.identifier.uri | http://hdl.handle.net/2262/71474 | |