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dc.contributor.authorDUESBERG, GEORGen
dc.contributor.authorMCEVOY, NIALLen
dc.contributor.authorNICOLOSI, VALERIAen
dc.contributor.authorBLAU, WERNERen
dc.date.accessioned2014-10-13T11:54:43Z
dc.date.available2014-10-13T11:54:43Z
dc.date.issued2010en
dc.date.submitted2010en
dc.identifier.citationKumar, S, McEvoy, N, Lutz, T, Keeley, GP, Nicolosi, V, Murray, CP, Blau, WJ, Duesberg, GS, Gas phase controlled deposition of high quality large-area graphene films, CHEMICAL COMMUNICATIONS, 46, 9, 2010, 1422-1424-en
dc.identifier.otherYen
dc.descriptionPUBLISHEDen
dc.description.abstractA gas phase controlled graphene synthesis resembling a CVD process that does not critically depend on cooling rates is reported. The controllable catalytic CVD permits high quality large-area graphene formation with deft control over the thickness from monolayers to thick graphitic structures at temperatures as low as 750 degrees C.en
dc.format.extent1422-1424en
dc.language.isoenen
dc.relation.ispartofseriesCHEMICAL COMMUNICATIONSen
dc.relation.ispartofseries46en
dc.relation.ispartofseries9en
dc.rightsYen
dc.subjectPhysicsen
dc.titleGas phase controlled deposition of high quality large-area graphene filmsen
dc.typeJournal Articleen
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/duesbergen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/wblauen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/nicoloven
dc.identifier.peoplefinderurlhttp://people.tcd.ie/mcevoynien
dc.identifier.rssinternalid64757en
dc.identifier.doihttp://dx.doi.org/10.1039/b919725gen
dc.rights.ecaccessrightsopenAccess
dc.contributor.sponsorScience Foundation Ireland (SFI)en
dc.identifier.urihttp://hdl.handle.net/2262/71474


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