HfO2 and SiO2 as barriers in magnetic tunneling junctions
Citation:
Shukla, G. and Archer, T. and Sanvito, S., HfO2 and SiO2 as barriers in magnetic tunneling junctions, Physical Review B, 95, 18, 2017, 184410-Download Item:
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Science Foundation Ireland (SFI)
14/IA/2624
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http://people.tcd.ie/sanvitosDescription:
PUBLISHEDcited By 0
Author: SANVITO, STEFANO
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Science Foundation Ireland (SFI)Type of material:
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Physical Review B95
18
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http://dx.doi.org/10.1103/PhysRevB.95.184410Metadata
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