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dc.contributor.authorSANVITO, STEFANOen
dc.date.accessioned2018-01-15T14:39:13Z
dc.date.available2018-01-15T14:39:13Z
dc.date.issued2017en
dc.date.submitted2017en
dc.identifier.citationShukla, G. and Archer, T. and Sanvito, S., HfO2 and SiO2 as barriers in magnetic tunneling junctions, Physical Review B, 95, 18, 2017, 184410-en
dc.identifier.otherYen
dc.descriptionPUBLISHEDen
dc.descriptioncited By 0en
dc.format.extent184410en
dc.relation.ispartofseriesPhysical Review Ben
dc.relation.ispartofseries95en
dc.relation.ispartofseries18en
dc.rightsYen
dc.titleHfO2 and SiO2 as barriers in magnetic tunneling junctionsen
dc.typeJournal Articleen
dc.type.supercollectionscholarly_publicationsen
dc.type.supercollectionrefereed_publicationsen
dc.identifier.peoplefinderurlhttp://people.tcd.ie/sanvitosen
dc.identifier.rssinternalid181061en
dc.identifier.doihttp://dx.doi.org/10.1103/PhysRevB.95.184410en
dc.rights.ecaccessrightsopenAccess
dc.identifier.orcid_id0000-0002-1203-0077en
dc.contributor.sponsorScience Foundation Ireland (SFI)en
dc.contributor.sponsorGrantNumber14/IA/2624en
dc.identifier.urihttp://hdl.handle.net/2262/82185


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