dc.contributor.author | Zhang, Hongzhou | en |
dc.date.accessioned | 2021-05-19T08:34:59Z | |
dc.date.available | 2021-05-19T08:34:59Z | |
dc.date.issued | 2019 | en |
dc.date.submitted | 2019 | en |
dc.identifier.citation | Maguire, P. and Jadwiszczak, J. and O'Brien, M. and Keane, D. and Duesberg, G.S. and McEvoy, N. and Zhang, H., Defect-moderated oxidative etching of MoS<inf>2</inf>, Journal of Applied Physics, 126, 16, 2019 | en |
dc.identifier.other | Y | en |
dc.description | PUBLISHED | en |
dc.description | cited By 1 | en |
dc.description.abstract | We report a simple technique for the selective etching of bilayer and monolayer MoS 2. In this work, chosen regions of MoS 2 were activated for oxygen adsorption and reaction by the application of low doses of He + at 30 keV in a gas ion microscope. Raman spectroscopy, optical microscopy, and scanning electron microscopy were used to characterize both the etched features and the remaining material. It has been found that by using a pretreatment to introduce defects, MoS 2 can be etched very efficiently and with high region specificity by heating in air. | en |
dc.language.iso | en | en |
dc.relation.ispartofseries | Journal of Applied Physics | en |
dc.relation.ispartofseries | 126 | en |
dc.relation.ispartofseries | 16 | en |
dc.rights | Y | en |
dc.subject | monolayer MoS 2 | en |
dc.subject | oxygen adsorption | en |
dc.subject | scanning electron microscopy | en |
dc.subject | Optical microscopy | en |
dc.subject | Oxidation | en |
dc.subject | 2D materials | en |
dc.subject | Crystallographic defects | en |
dc.subject | Scanning electron microscopy | en |
dc.subject | Focused ion beam | en |
dc.subject | Raman spectroscopy | en |
dc.subject | Chemical vapor deposition | en |
dc.title | Defect-moderated oxidative etching of MoS<inf>2</inf> | en |
dc.type | Journal Article | en |
dc.type.supercollection | scholarly_publications | en |
dc.type.supercollection | refereed_publications | en |
dc.identifier.peoplefinderurl | http://people.tcd.ie/hozhang | en |
dc.identifier.rssinternalid | 226147 | en |
dc.identifier.doi | http://dx.doi.org/10.1063/1.5115036 | en |
dc.rights.ecaccessrights | openAccess | |
dc.subject.TCDTheme | Nanoscience & Materials | en |
dc.identifier.orcid_id | 0000-0002-1188-7810 | en |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.contributor.sponsorGrantNumber | 15/SIRG/3329 | en |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.contributor.sponsorGrantNumber | 15/IA/3131 | en |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.contributor.sponsorGrantNumber | 12/RC/2278 | en |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.contributor.sponsorGrantNumber | 11/PI/1105 | en |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.contributor.sponsorGrantNumber | 08/CE/I143 | en |
dc.contributor.sponsor | Science Foundation Ireland (SFI) | en |
dc.contributor.sponsorGrantNumber | 07/SK/I1220 | en |
dc.identifier.uri | http://hdl.handle.net/2262/96370 | |